Samsung and ASML Expand Collaboration on High NA EUV Lithography
Samsung Electronics and ASML announced an expansion of their strategic partnership. The companies will deepen cooperation on High NA EUV lithography and advanced semiconductor manufacturing technologies intended to support next-generation innovation in the AI era.
Samsung Electronics and ASML announced an expansion of their long-standing strategic partnership in advanced semiconductor manufacturing.
The collaboration will focus on High NA EUV lithography, a technology the companies associate with developing and deploying next-generation chips.
The expanded work builds on years of cooperation between Samsung and ASML. The companies said they will work to accelerate the development and deployment of the relevant manufacturing technologies.
The announcement did not specify further milestones, timelines or performance figures for the joint work.
What we know
- Samsung and ASML expanded their strategic partnership in advanced semiconductor manufacturing.
- The joint work will cover High NA EUV lithography.
- The companies plan to accelerate development and deployment of chip-manufacturing technologies.
- The partnership builds on years of cooperation between Samsung and ASML.
Trust: Primary source
- The story cites a primary statement. It establishes what its author said, but does not guarantee every claim is true.
- Sources: Samsung Newsroom.
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